| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing technique which can reduce the consumption amount of vapor of an organic solvent. SOLUTION: After cleaning of a substrate W is completed in a processing bath 20, pure water is discharged from the processing bath 20 while a nitrogen gas is supplied thereinto from supply nozzles 40. And the substrate W is held within the bath 20, under which condition IPA vapor flows FI are discharged toward an opening 20P of the bath 20 from the nozzles 40. Thereby the IPA vapor is made to flow into the bath 20 and the substrate W within the bath 20 is dried. As a result, since it becomes suffice to supply the IPA vapor only to the bath 20 having a volume smaller than an accommodation vessel 10, the consumption amount of vapor of an organic solvent can be reduced.
|
