| 摘要 |
PROBLEM TO BE SOLVED: To provide a maintenance method and system of a plasma treatment apparatus, which eliminate needs for complicated work and experience requiring the intermediation of humans, reduce manual work until operation start, and shorten recovery time. SOLUTION: In a semiconductor manufacturing apparatus using a plasma, in recovery work after wet cleaning of a vacuum treatment chamber configuration member that is carried out by opening a vacuum treatment chamber to the atmosphere in maintenance or the like, accept/reject decisions are performed automatically or semiautomatically according to the preset optimum sequence specific to an apparatus, and at the same time move to the next treatment is made automatically or semiautomatically. |
