| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing system in which a plasma can be ignited under pressure conditions optimal for processing a substrate. SOLUTION: The plasma processing system 100a performing specified processing of a substrate 11 comprises a chamber 1 in which a plasma generation region 13 is formed and the substrate 11 is introduced, and an electron generating member 201 disposed in the chamber 1. The electron generating member 201 contains barium oxide, strontium oxide, calcium oxide, yttrium oxide, or the like. |
