发明名称 METHOD OF CRYSTALLIZING SILICON
摘要 PROBLEM TO BE SOLVED: To provide a method of crystallizing a silicon by which a high quality crystal can be grown at a higher speed by proposing a method of crystallizing a transmission region, by utilizing a mask having a transmission region of a new form and a laser beam pattern through the mask. SOLUTION: There is provided a method of crystallizing a silicon, in particular, a method of prompting Sequential Lateral Solidification(SLS) of silicon grains in a low temperature silicon crystallization method utilizing a laser beam pattern. A laser beam pattern is formed in a triangular shape. When crystallization is proceeded while the beam pattern in a triangular shape is moved laterally, a large area can be crystallized at a high speed, and the growth length of grains constituting a crystalline film can be increased. Accordingly, productivity can be improved.
申请公布号 JP2003045803(A) 申请公布日期 2003.02.14
申请号 JP20020167971 申请日期 2002.06.07
申请人 LG PHILIPS LCD CO LTD 发明人 YANG MYOUNG-SU
分类号 H01L21/268;H01L21/20;H01L21/336;H01L29/786;(IPC1-7):H01L21/20 主分类号 H01L21/268
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