| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing an EL element through photolithography method preventing mixing of colors between an edge portion of a patterned light-emitting part and a different light-emitting layer deposited thereon afterwards, and preventing pixels from getting narrower. SOLUTION: The method of manufacturing the EL element includes a process for forming a light-emitting layer 4 and a photoresist layer 5 on a base 1 in that order, a process for subjecting the photoresist layer 5 to pattern exposure and then developing it in such a way that the portion of the photoresist layer 5 corresponding to a predetermined light-emitting part is left behind, a process for forming a light-emitting part 4' covered on its surface with the photoresist layer 5 by removing the light-emitting layer 4 exposed upon removal of the photoresist layer 5, a process for forming a photoresist layer 5' over the light- emitting part 4' on the base 1, and a process for subjecting the photoresist layer 5' to pattern exposure and developing it in such a way that the light- emitting part 4' and its end portions are not exposed.
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