HEAT TREATMENT APPARATUS FOR SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a heat treatment apparatus which can cool a substrate quickly on a high temperature side. SOLUTION: A movable partition plate 52 is provided between a lower surface of a substrate W held in a heat treatment furnace and the lower furnace wall 44 of the heat treatment furnace. In order to cool the substrate after a heat treatment, the movable partition plate is brought close to the substrate to form a gas passage 88 between the upper surface of the partition plate, and the lower surface of the substrate and cooling gas is introduced into the gas passage through a gas supply pipe 56.