发明名称 METHOD AND DEVICE FOR PERFORMING HEAT TREATMENT OF SUBSTRATES
摘要 PROBLEM TO BE SOLVED: To apply the same heat progress to all object. SOLUTION: A method and a device are for the heat treatment of flat substrates and the substrates are positioned in the vicinity of a heated, essentially flat furnace body extending over the surface of the substrate. In order to provide a reproducible treatment when treating a number of substrates successively, the temperature of the furnace body is measured close to the surface adjacent to the substrate that the loss of heat from the furnace body by the substrate can be detected. The introduction of each substrate takes place at a point in time when the temperature measured in this way is, within certain limits, equal to a desired initial treatment temperature Ttrig .
申请公布号 JP2003045881(A) 申请公布日期 2003.02.14
申请号 JP20020141793 申请日期 2002.05.16
申请人 ASM INTERNATL NV 发明人 STORM ARJEN;BAST RONALD;KUZNETSOV VLADIMIR IVANOVICH;ZINGER JAN
分类号 H01L21/324;H01L21/00;(IPC1-7):H01L21/324 主分类号 H01L21/324
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