发明名称 |
FIELD EMISSION TYPE ELECTRON SOURCE |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a field emission type electron source with small spreading of energy distribution of electrons emitted. SOLUTION: A field emission type electron source element 10a and Peltier element 30 are formed on the side of a main surface of an n-type silicon substrate 1. The electron source element 10a is structured with an n-type silicon substrate 1, a semiconductor layer 3 consisting of a polycrystalline silicon layer formed on the main surface of the n-type silicon substrate, a high-field drift layer consisting of an oxidized porous polycrystalline silicon layer formed on the semiconductor layer 3, and a surface electrode 7 formed on the high-field drift layer 6. The high-field drift layer 6 constitutes a drift part, and the n-type silicon substrate 1 and an ohmic electrode (not illustrated) on the rear surface of the n-type silicon substrate 1 constitute a lower electrode. The Peltier element 30 constitutes a cooling means for cooling the electron source element 10a.</p> |
申请公布号 |
JP2003045318(A) |
申请公布日期 |
2003.02.14 |
申请号 |
JP20010225484 |
申请日期 |
2001.07.26 |
申请人 |
MATSUSHITA ELECTRIC WORKS LTD |
发明人 |
HATAI TAKASHI;KOMODA TAKUYA;AIZAWA KOICHI;HONDA YOSHIAKI;WATABE YOSHIFUMI;KUNUGIBARA TSUTOMU;BABA TORU |
分类号 |
H01J7/24;H01J1/312;(IPC1-7):H01J1/312 |
主分类号 |
H01J7/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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