发明名称 FIELD EMISSION TYPE ELECTRON SOURCE
摘要 <p>PROBLEM TO BE SOLVED: To provide a field emission type electron source with small spreading of energy distribution of electrons emitted. SOLUTION: A field emission type electron source element 10a and Peltier element 30 are formed on the side of a main surface of an n-type silicon substrate 1. The electron source element 10a is structured with an n-type silicon substrate 1, a semiconductor layer 3 consisting of a polycrystalline silicon layer formed on the main surface of the n-type silicon substrate, a high-field drift layer consisting of an oxidized porous polycrystalline silicon layer formed on the semiconductor layer 3, and a surface electrode 7 formed on the high-field drift layer 6. The high-field drift layer 6 constitutes a drift part, and the n-type silicon substrate 1 and an ohmic electrode (not illustrated) on the rear surface of the n-type silicon substrate 1 constitute a lower electrode. The Peltier element 30 constitutes a cooling means for cooling the electron source element 10a.</p>
申请公布号 JP2003045318(A) 申请公布日期 2003.02.14
申请号 JP20010225484 申请日期 2001.07.26
申请人 MATSUSHITA ELECTRIC WORKS LTD 发明人 HATAI TAKASHI;KOMODA TAKUYA;AIZAWA KOICHI;HONDA YOSHIAKI;WATABE YOSHIFUMI;KUNUGIBARA TSUTOMU;BABA TORU
分类号 H01J7/24;H01J1/312;(IPC1-7):H01J1/312 主分类号 H01J7/24
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