发明名称 THIN FILM TYPE ND FILTER AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a thin film ND filter which can uniformly attenuate the light quantity in the visible region and has excellent durability. SOLUTION: The ND filter is a thin film type produced by depositing light absorbing films 3, 5 and dielectric films 2, 4, 6 on a transparent substrate 1. The light absorbing films 3, 5 are formed by vapor deposition by using a metal material Ti as the source material and contains oxides TiOx of the metal material produced by introducing a mixture gas containing oxygen during the deposition while keeping a constant vacuum degree in the range from 1×10<-3> Pa to 1×10<-2> Pa. The oxygen proportion in the mixture gas is controlled to <=50%. Preferably, after the light absorbing films 3, 5 and dielectric films 2, 4, 6 are deposited on the transparent substrate 1, the films are heated in an oxygen atmosphere containing >=10% oxygen to saturate changes in the optical characteristics.
申请公布号 JP2003043211(A) 申请公布日期 2003.02.13
申请号 JP20010226999 申请日期 2001.07.27
申请人 NIDEC COPAL CORP 发明人 KUNII KOKI
分类号 G02B5/00;C23C14/06;G02B1/10;G02B5/20;G02B5/28;(IPC1-7):G02B5/00 主分类号 G02B5/00
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