| 摘要 |
<p>A high frequency ion plating vapor deposition system for applying vapor deposition to a vapor deposition substrate (15) in a vacuum belljar (13), comprising a vapor deposition substrate dome (17) for supporting the vapor deposition substrate (15), one or more vapor deposition source (19) disposed oppositely to the vapor deposition substrate dome (17), a first high frequency ring (23) disposed approximately directly above each vapor deposition source (19) and having opposite end parts connected with a first high frequency power supply (21), and a second high frequency ring (27) disposed proximately to the vapor deposition substrate dome (17) and having opposite end parts connected with a second high frequency power supply (25). According to the arrangement, a desired vapor deposition film can be formed well and uniformly on the vapor deposition substrate.</p> |
