发明名称 NAND-type flash memory device and method of forming the same
摘要 A NAND-type flash memory device for preventing punchthrough and a method for forming the same are provided. The NAND-type flash memory device includes a string selection transistor, a plurality of cell memory transistors, and a ground selection transistor being sequentially connected in series. The device further includes a bitline contact connected to a drain region of the string selection transistor, and a common source line connected to a source region of the ground selection transistor. Impurities are heavily doped to a drain-to-channel interface in the string selection transistor and a channel-to-source interface in the ground selection transistor, forming pockets for preventing punchthrough. The pockets are preferably formed using a tilted ion implantation using the vertical gate structures as masks.
申请公布号 US2003032245(A1) 申请公布日期 2003.02.13
申请号 US20020272972 申请日期 2002.10.16
申请人 SAMSUNG ELECTRONICS CO., LTD 发明人 YIM YONG-SIK;CHOI JUNG-DAL
分类号 H01L21/8247;H01L27/115;(IPC1-7):H01L21/336 主分类号 H01L21/8247
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