| 发明名称 |
Method of forming film pattern, device for forming film pattern, conductive film wiring, electro-optical device, electronic device, and non-contact card medium |
| 摘要 |
The present invention provides a method of forming a functional film pattern which allows the forming of fine film patterns with simplified steps. The present invention also provides a method of forming a functional film pattern where such defects as disconnection and short circuit rarely occurs, and forming a pattern which has a large thickness and is good for exhibiting a function such as electric conduction can be formed. |
| 申请公布号 |
US2003030689(A1) |
申请公布日期 |
2003.02.13 |
| 申请号 |
US20020179387 |
申请日期 |
2002.06.26 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HASHIMOTO TAKASHI;FURUSAWA MASAHIRO |
| 分类号 |
B05C5/00;B05D1/26;B05D3/02;B05D5/12;B41J2/01;G02F1/13;H01J9/02;H01J11/02;H01J11/22;H01J11/34;H01L21/00;H01L21/288;H01L21/31;H01L21/336;H01L21/768;H01L29/786;(IPC1-7):B41J2/015;B41J29/38;H01L21/44 |
主分类号 |
B05C5/00 |
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