SPUTTERING TARGET, PHASE SHIFT MASK BLANK USING THE SPUTTERING TARGET AND METHOD OF MANUFACTURING PHASE SHIFT MASK

摘要

PROBLEM TO BE SOLVED: To provide a sputtering target which is used for forming photosemipermeable sections of a phase shift mask and contains at least metal and borosilicate glass. SOLUTION: In manufacturing a phase shift film by a sputtering method, the sputtering target containing the borosilicate glass is used as the sputtering target, by which the phase shift mask blank and phase shift mask having the photosemitransmissive film (phase shift film) surpassed in chemical resistance are provided.