| 摘要 |
PROBLEM TO BE SOLVED: To provide a method which has excellent workability and is capable of manufacturing a metallic foil mesh of a simple substance having excellent light transmittability and electromagnetic wave shieldability in combination by a simple process step. SOLUTION: A photoresist layer A is formed on one surface of the metallic foil 5 and a photoresist layer B provided with a transparent base 3 of 50 to 200 μm in thickness is formed on another surface of the metallic foil 5. The photoresist layer A is then exposed with the prescribed mesh patterns and the photoresist layer B is exposed over the entire surface, by which the developed resist sections 7 are formed. The undeveloped sections 8 of the photoresist layer A are thereafter removed and after the metallic foil 5 corresponding to the removed segments is etched, following which the developed resist sections 7 on both surfaces of the metallic foil 5 are removed and the simple substance of the metallic foil mesh is manufactured. |
