发明名称 |
Lithography system comprising a converter platc and means for protecting the converter plate |
摘要 |
A lithography system comprising a converter element (7) for receiving light and converting said light in a plurality of electron beams (15) to be directed towards and focused on a substrate (10) to be processed, said plurality of electron beams (15) being used to define a pattern in a resist layer (20) on said substrate (10), wherein said lithography system is provided with a protective foil with holes at the positions of the electron beams (23) being arranged to protect, in use, said converter element (7) from contamination with material from the resist layer (21).
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申请公布号 |
US2003030014(A1) |
申请公布日期 |
2003.02.13 |
申请号 |
US20020218223 |
申请日期 |
2002.08.13 |
申请人 |
WIELAND MARCO;KAMPHERBEEK BERT JAN;KRUIT PIETER |
发明人 |
WIELAND MARCO;KAMPHERBEEK BERT JAN;KRUIT PIETER |
分类号 |
G03F7/20;H01J37/073;H01J37/317;(IPC1-7):H01J37/317 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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