发明名称 THERMALLY DEVELOPABLE PHOTOSENSITIVE MATERIAL AND IMAGE FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a thermally developable photosensitive material giving sufficient Dmax even in an environment of low temperature and low humidity and free of the occurrence of black spots. SOLUTION: In the thermally developable photosensitive material containing an organic silver salt and a reducing agent on at least one face of a support, at least one compound of formula (X), (Y) or (Z) and at least one compound of formula (T) are contained. In formula (X), R<1> to R<3> are each a substituent or the like and Z is an electron attractive group or the like. Formula (Y) and X and Y in formula (Z) are each a substituent or the like and A and B are each an alkoxy or the like. In formula (T), R<1> is an alkyl or the like; L is a linking group; M<1> is H or the like; (m) is 0 to 5; and (n) is 1 to 3.
申请公布号 JP2003043616(A) 申请公布日期 2003.02.13
申请号 JP20010234341 申请日期 2001.08.02
申请人 FUJI PHOTO FILM CO LTD 发明人 EZOE TOSHIHIDE
分类号 G03D13/00;G03C1/498;G03C5/08;(IPC1-7):G03C1/498 主分类号 G03D13/00
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