发明名称 DEVICE AND METHOD FOR COATING AND/OR TREATING THE SURFACES OF SUBSTRATES USING LOW-PRESSURE PLASMA
摘要 The invention relates to a device for coating and/or treating the surfaces of substrates using low-pressure plasma, whereby at least one substrate is placed inside the device. The device comprises a cathode, an anode and an auxiliary electrode provided with openings. The glow discharge is generated by means of cathodes and anodes. The invention also relates to a method for coating and/or treating the surfaces of substrates using low-pressure plasma inside said device. The inventive device is used for treating the surfaces of substrates, for example, for cleaning and activating as well as for producing wear protective layers, corrosion protective layers or antistick layers.
申请公布号 WO02092871(A3) 申请公布日期 2003.02.13
申请号 WO2002EP02397 申请日期 2002.03.05
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.;JUNG, THOMAS 发明人 JUNG, THOMAS
分类号 H01J37/32 主分类号 H01J37/32
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