发明名称 METHOD FOR FORMING FINE BARRIER, METHOD FOR FABRICATING PLANAR DISPLAY AND ABRASIVE FOR BLAST
摘要 <p>A method for forming a fine barrier having a stabilized shape with a good machining accuracy and a high grinding efficiency using a jet machining method, a method for fabricating a planar display by applying that method, and an abrasive for blasting being used in these methods. At the time of forming fine barriers on the surface of a substrate, blast is performed using an abrasive composed of calcium carbonate powder coated with silicon. Each particle composing the abrasive has a three-dimensional shape formed by layering polygonal layers having polygonal shapes, including triangular shapes, of different sizes. Maximum particle size of the abrasive is not larger than 1/2 of the width (W1) of the fine barrier and the mean particle size of the abrasive is not larger than 1/5 of the width (W1) of the fine barrier. Maximum particle size of the abrasive is not larger than 10 µm. Pitch (P1) of the fine barriers is not larger than 150 µm, the width (W1) of the fine barrier (24) is not larger than 50 µm and the height (H1) of the fine barrier (24) is not larger than 300 µm. Thickness of a resist film (30) is not larger than 1.2 times the width (W1) of the fine barrier (24).</p>
申请公布号 WO2003011526(P1) 申请公布日期 2003.02.13
申请号 JP2002007252 申请日期 2002.07.17
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