| 发明名称 |
COMPOSITION HAVING PERMITIVITY BEING RADIATION−SENSITIVELY CHANGEABLE AND METHOD FOR FORMING PERMITIVITY PATTERN |
| 摘要 |
<p>A composition having a permitivity being radiation−sensitively changeable,which comprises(A)a decomposable compound,(B)a non−decomposable compound,(C)a radiation−sensitive decomposer and(D)a stabilizer.The composition allows the achievement of the change of the permitivity of a material,which is satisfactorily great and stable,in an easy and simple manner,and thus can provide a permitivity pattern and an optical material having a satisfactory distribution of permitivity being stable independently of the condition for its use.</p> |
| 申请公布号 |
WO03012547(A1) |
申请公布日期 |
2003.02.13 |
| 申请号 |
WO2002JP07561 |
申请日期 |
2002.07.25 |
| 申请人 |
JSR CORPORATION;NISHIMURA, ISAO;BESSHO, NOBUO;KUMANO, ATSUSHI;YAMADA, KENJI |
发明人 |
NISHIMURA, ISAO;BESSHO, NOBUO;KUMANO, ATSUSHI;YAMADA, KENJI |
| 分类号 |
G03F7/00;G03F7/004;G03F7/039;G03F7/075;G03F7/26;G03F7/38;H01L21/027;H01L21/312;H01L23/12;H05K1/00;H05K1/16;(IPC1-7):G03F7/004;C08L101/00;G03F7/36 |
主分类号 |
G03F7/00 |
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