| 摘要 |
A Chromeless phase shift mask utilizes a line width control region having an incline phase shift structure located between a transparent region and a phase shift region and tapered from the edge of the phase shift layer to produce destructive interference of an incident radiation transmitted through the line width control region, and the intensity of the transmitted radiation is thereby decreased. Therefore, the line width of non-exposure region can be freely controlled by the line width control region and not restricted to the wavelength of the incident radiation.
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