Method of layout compaction

摘要

It is an object of the invention to carry out layout compaction in which optical proximity effect is taken account of the irregularly disposed layout patterns also contained within circuit design data to increase the degree of integration of the semiconductor integrated circuit devices. A compaction control step generates a compaction condition; an optical proximity correction condition generation step generates an optical proximity correction information; a layout compaction step compacts an input layout pattern; an optical proximity correction step corrects an optical proximity effect: a corrected layout pattern retention step retains an optical proximity corrected layout pattern; a verification step verifies circuit operation on compacted and optical proximity corrected layout patterns; an error data retention step retains a layout pattern having any problem; the compaction control step generates a compaction condition again in which optical proximity effect and error data are taken account of; and the above-mentioned steps are repeated.