| 摘要 |
PROBLEM TO BE SOLVED: To form a transparent film by an easy method without damaging a first photoresist. SOLUTION: In the method for forming a multilayer resist pattern having two kinds of depth by successively forming a first photoresist 101, a transparent film 102 and a second photoresist 103 on a substrate 100, the transparent film 102 is formed by spraying a solution on the substrate where the first photoresist 101 is deposited and heated at a specified temperature. |
