Photosensitive composition and process for producing articles covered with a patterned film

摘要

A process for producing articles covered with a patterned film which can be formed by a short time of exposure and has high development sensitivity after exposure and excellent pattern accuracy and a photosensitive composition. The process comprises applying the photosensitive composition to a substrate, exposing the coating film to light in a pattern-form to polymerize exposed portions of the coating film, dissolving and removing unexposed portions. The composition comprises a metal alkoxide, a beta-diketone and acrylic acid or methacrylic acid.