ETCHING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: An etching apparatus for manufacturing a semiconductor device is provided to obtain more reliable temperature data of a process chamber independent of RF(Radio Frequency) power and to control temperature precisely by minimizing temperature deviation of the process chamber. CONSTITUTION: The process chamber(10) of an etching apparatus has an upper chamber(11) and a lower chamber(12), in which a cooling line passes through each chamber for preventing overheat of the chamber. A temperature sensor(30) is provided at the drain port of the cooling line(22) passing through the lower chamber(12). Another temperature sensor(30) is provided at the drain port of the cooling line(21) passing through the upper chamber(11), in which the temperature sensor(30) is located outside the process chamber(10). The location of the temperature sensor(30) in the upper chamber prevents interference of RF power.