| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering device in which an ultimate vacuum is improved. SOLUTION: In the sputtering device, a space surrounded with an O-ring 51, a target 60 and a vacuum tank 2 is made a vacuum atmosphere, and an insulating member 4 is arranged at the outside of the space. The insulating member 4 is not exposed directly to the space surrounded with the O-ring 51, the target 60 and the vacuum tank 2, that is, the inside of the vacuum tank 2. Therefore, release of gases from the insulating member 4 to the inside of the vacuum tank 2 is avoided and the amount of gases discharged into the inside of the vacuum tank 2 is made small even when the insulating member 4 releasing relatively large amount of gases is used. Accordingly, the ultimate vacuum can be improved.
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