Maskless particle-beam system for exposing a pattern on a substrate,申请号GB20030000693-传众专利搜索

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发明名称	Maskless particle-beam system for exposing a pattern on a substrate
摘要
申请公布号	GB0300693(D0)	申请公布日期	2003.02.12
申请号	GB20030000693	申请日期	2003.01.13
申请人	IMS NANOFABRICATION GMBH	发明人
分类号	G03F7/20;H01J37/04;H01J37/09;H01J37/305;H01J37/317;H01L21/027	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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