发明名称 APPARATUS FOR TREATING WITH PLASMA
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for treating with plasma which is capable of forming strong and uniform plasma over a large area and has a transmission window for microwaves whose cost is low. SOLUTION: The apparatus for treating with plasma is equipped with a vacuum chamber 1 capable of maintaining an atmosphere having a reduced pressure lower than the atmosphere, a wave guide 9 for guiding the microwaves and a microwave introducing part 7 for introducing the microwaves guided by the wave guide 9 into the vacuum chamber 1. In the apparatus for treating with plasma, the plasma can be generated by the microwaves introduced into the vacuum chamber 1 via the microwave introducing part 7. The microwave introducing part 7 has a nearly cylindrical part 7B having a nearly cylindrical form and an upper surface part 7A which is provided so as to close one of the opening parts of the nearly cylindrical part 7B, and the wave guide 9 is provided so as to surround the periphery of the nearly cylindrical part 7B.
申请公布号 JP2003038951(A) 申请公布日期 2003.02.12
申请号 JP20010228878 申请日期 2001.07.30
申请人 SHIBAURA MECHATRONICS CORP 发明人 TSUGAMI YOSHIZO
分类号 H05H1/46;B01J19/08;C23C16/511;H01L21/302;H01L21/3065 主分类号 H05H1/46
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