发明名称 Obtaining a Lotus effect by preventing microbial growth on self-cleaning surfaces
摘要 A lotus-effect surface comprising a substrate having a surface and a plurality of irregularities associated with the surface, where the lotus-effect surface comprises at least one anti-microbial material. An Independent claim is also included for a process for producing the lotus-effect surface comprising producing a surface structure with at least one material having an antimicrobial property. The lotus-effect surface, where the irregularities are particles. The surface comprises particles having an irregular fine nanostructure. The irregularities comprise a mixture of one or more types of hydrophobic particles and one or more types of anti-microbial particles, preferably comprising a particle mixture that is about 0.01 - 25 wt.% particles with antimicrobial properties. The lotus-effect surface comprises particles attached to the substrate by means of a carrier system. The carrier system comprises a chemical fixative, adhesive, adhesion promoter, surface coating or curable substance. The lotus-effect surface comprises a coating that is UV curable, hot-curing or air curing. The lotus-effect surface comprising at least one substrate material or molding selected from one or more polymer(s), metal(s), wood(s), leather(s), fiber(s), fabric(s), glass(es), and ceramic(s). The lotus-effect surface comprises at least one substrate material or molding selected from a polyamide, polyurethane, polyether block amide, polyesteramide, polyvinyl chloride, polyolefin, polysilicone, polysiloxane, polymethyl methacrylate, and polyterephthalate. The lotus-effect surface comprising at least one antimicrobial polymer that may be prepared from at least one monomer selected from 2-tert-butylaminoethyl methacrylate, 2-diethylaminoethyl methacrylate, 2-diethylaminomethyl methacrylate, 2-tert-butylaminoethyl acrylate, 3-dimethylaminopropyl acrylate, 2-diethylaminoethyl acrylate, 2-dimethylaminoethyl acrylate, dimethylaminopropylmethacrylamide, diethylaminopropylmethacrylamide, N-3-dimethylaminopropylacrylamide, 2-methacryloyloxyethyltrimethylammonium methosulfate, 2-methacryloyloxyethyltrimethylammonium chloride,3-methacryloylaminopropyltrimethylammonium chloride, 2-acryloyloxyethyl-4-benzoyldimethylammonium bromide, 2-methacryloyloxyethyl-4-benzoyldimethylammonium bromide, 2-acrylamido-2-methyl-1-propanesulfonic acid, 2-diethylaminoethyl vinyl ether, and 3-aminopropyl vinyl ether. Preferred Process: The process comprising producing a surface that has elevations, depressions, or both. Preferably producing the surface structure by applying particles to a substrate and securing them. The process comprising applying one or more hydrophobic particle(s), one or more antimicrobial particle(s), or both. The particles, are secured to the substrate using a carrier system. The carrier system comprising the use of chemical fixation or a coating system. Preferably the carrier system comprises use of an adhesive, surface coating, adhesion promoter, or curable substance. The substrate, the particles, and/or the carrier system comprises an antimicrobial material. The particles comprise least one material selected from the group consisting of a silicate, doped silicate, mineral, metal oxide, silica, and polymer, mixed with homo- or copolymer particles selected from the group consisting of 2-tert-butylaminoethyl methacrylate, 2-diethylaminoethyl methacrylate, 2-diethylaminomethyl methacrylate, 2-tert-butylaminoethyl acrylate, 3-dimethylaminopropyl acrylate, 2-diethylaminoethyl acrylate, 2-dimethylaminoethyl acrylate, dimethylaminopropylmethacrylamide, diethylaminopropylmethacrylamide, N-3-dimethylaminopropylacrylamide, 2-methacryloyloxyethyltrimethylammonium methosulfate, 2-methacryloyloxyethyltrimethylammonium chloride, 3-methacryloylaminopropyltrimethylammonium chloride, 2-acryloyloxyethyl-4-benzoyldimethylammonium bromide, 2-methacryloyloxyethyl-4-benzoyldimethylammonium bromide, 2-acrylamido-2-methyl-1-propanesulfonic acid, 2-diethylaminoethyl vinyl ether, and 3-aminopropyl vinyl ether.
申请公布号 EP1283077(A1) 申请公布日期 2003.02.12
申请号 EP20020013873 申请日期 2002.06.22
申请人 CREAVIS GESELLSCHAFT FUER TECHNOLOGIE UND INNOVATION MBH 发明人 NUN, EDWIN DR.;OLES, MARKUS, DR.
分类号 B05D5/00;A01N25/34;A01N33/08;A01N37/12;A01N37/20;A01N41/04;A01N61/00;B05D7/24;B08B17/00;B08B17/06 主分类号 B05D5/00
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