发明名称 LASER IRRADIATING DEVICE, LASER IRRADIATING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 <p>PURPOSE: A method and a device are provided to be capable of constantly setting the energy distribution of a laser beam on an irradiating face, and uniformly irradiating the laser beam to the entire irradiating face. CONSTITUTION: Each of the plural laser beams(101a,101b,101c) is shortened in the short side direction by cylindrical lenses(102a,102b,102c), and becomes laser beams(103a,103b,103c) having an elliptical shape or a rectangular shape on an irradiating face. In order to form a laser beam having an elliptical shape or a rectangular shape on an irradiating face, a grating is used. If a stage is moved in a direction shown by reference numeral(106), the laser beam is irradiated in a direction shown by reference numeral without changing the incident angle of the laser beam to the substrate. When the irradiation of the laser beam in the direction shown by reference numeral is terminated, the stage is moved in a direction shown by reference numeral(107). The laser beam is irradiated in the direction shown by reference numeral(106) if the stage is moved in the direction shown by reference numeral while the laser beam is irradiated. The laser beam is irradiated to the entire substrate face by repeating these movements.</p>
申请公布号 KR20030011724(A) 申请公布日期 2003.02.11
申请号 KR20020045853 申请日期 2002.08.02
申请人 SEMICONDUCTOR ENERGY LABORATORY K.K. 发明人 TANAKA KOICHIRO
分类号 H01S5/06;B23K26/06;B23K26/067;B23K26/073;B23K26/10;H01L21/20;(IPC1-7):H01S5/06 主分类号 H01S5/06
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