| 摘要 |
An exposure apparatus includes a projection optical system for projecting a pattern onto a substrate, a detector for detecting information relating to at least one of a plurality of optical characteristics of the projection optical system, a storage unit for storing information regarding a relationship between the at least one of the optical characteristics and at least another one of the optical characteristics and an extraction unit for extracting control data for the at least another one of the optical characteristics on the basis of information detected by the detector and storage information stored by the storage unit.
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