SUBSTRATE TREATMENT APPARATUS

摘要

PROBLEM TO BE SOLVED: To improve a temperature controlability of a hot body for heating a reactant gas supplied to a reaction chamber, in a substrate treatment apparatus for treating a substrate with the gas, which arranges the hot body in the upstream of the substrate to be treated. SOLUTION: This substrate treatment apparatus comprises several hot bodies 41 and 42 for heating the gas, each capable of controlling the own temperature, in the reaction chamber 1.