PHOTORESIST RESIDUE REMOVING SOLUTION COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a photoresist residue removing solution composition which is excellent in power to remove photoresist residue remaining after dry etching in a process for producing a semiconductor circuit element and does not attack a wiring material, an interlayer dielectric film, etc. SOLUTION: The photoresist residue removing solution composition contains a blend of a photoresist residue removing component with one or more compounds selected from the group comprising vinylcarboxylic acid polymers and their salts.