| 摘要 |
PROBLEM TO BE SOLVED: To provide an aluminum raw material for CVD, which matches with various CVD methods, and a method for manufacturing an aluminum-based thin film with the raw material. SOLUTION: The raw material for chemical vapor deposition includes an aluminum compound expressed by general formula (I): (wherein, either of R1 or R2 expresses a 1-4C alkyl group, the other expresses a hydrogen atom or a 1-4C alkyl group, (A) expresses a 1-4C alkylene group, and R2 expresses a 1-8C alkyl group, which may include an oxygen atom in the chain).
|
