发明名称 Ni-PLATED PARTICLE AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide Ni-plated particles having superior electroconductivity, little cohesiveness, and uniform thickness of the Ni film. SOLUTION: The Ni-plated particle 1 having a Ni film 3 plated by an electroless Ni plating method on the surface of a particle core 2, has a less P content in the surface side 3x than in the particle core side 2, along a depth direction of the whole Ni film 3.
申请公布号 JP2003034879(A) 申请公布日期 2003.02.07
申请号 JP20010225823 申请日期 2001.07.26
申请人 SONY CHEM CORP 发明人 YOSHINARI MAKOTO;KOJIMA RYOJI
分类号 C23C18/36;(IPC1-7):C23C18/36 主分类号 C23C18/36
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