发明名称 LIQUID PROCESSING METHOD, METHOD OF MANUFACTURING ELECTRO-OPTICAL APPARATUS, ELECTRO-OPTICAL APPARATUS, ELECTRONIC APPARATUS AND LIQUID PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a liquid processing method in which processing liquid supplied on a substrate does not stay on the substrate and flows smoothly when development and cleaning are performed by supplying the processing liquid to the substrate to be carried, and also to provide a method of manufacturing an electro-optical apparatus using this method, an electro-optical apparatus manufactured by the same method, an electronic apparatus using the same electro-optical apparatus and a liquid processing apparatus. SOLUTION: In a development processing apparatus 500, when a photosensitive resin formed on the surface of a large size substrate 100 is developed, a large-sized substrate 100 is shaked in the longer side direction where the processing liquid tends not to flow smoothly so that the development liquid supplied on the large size substrate 100 flows toward lower side due to the operation in which the end part is moved in the vertical directions because of the shaking. As a result, the processing liquid flows smoothly in the longer side direction, and the developing liquid is not left on the large-sized substrate 100.
申请公布号 JP2003037034(A) 申请公布日期 2003.02.07
申请号 JP20010220591 申请日期 2001.07.19
申请人 SEIKO EPSON CORP 发明人 WACHI REIKO
分类号 G02F1/13;B08B3/02;G02F1/1333;H01L21/027;H01L21/677;H01L21/68;(IPC1-7):H01L21/027;G02F1/133 主分类号 G02F1/13
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