发明名称 METHOD FOR MANUFACTURING SUBSTRATE WITH METAL PATTERN, SUBSTRATE WITH METAL PATTERN, METHOD FOR MANUFACTURING SUBSTRATE WITH METAL PATTERN FOR LIQUID CRYSTAL DISPLAY, SUBSTRATE WITH METAL PATTERN FOR LIQUID CRYSTAL DISPLAY AND LIQUID CRYSTAL DISPLAY
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate with a metal pattern, which can reduce the number of processes, and does not deteriorate or corrode the metal pattern, give the metal pattern flaws, stains or the like, and leave a residue of a photosensitive resin, and to provide the substrate with the metal pattern, a method for manufacturing the substrate with the metal pattern for a liquid crystal display, the substrate with the metal pattern for the liquid crystal display and the liquid crystal display. SOLUTION: This method for manufacturing the substrate with the metal pattern comprises developing a photosensitive resin film 4a on the metal film 3a to form a predetermined pattern of the photosensitive resin film, etching the above metal film 3a to form the metal pattern 3b, and then leaving the photosensitive resin pattern as a protective film 4b for the above metal pattern 3b, without removing the photosensitive resin pattern.
申请公布号 JP2003034884(A) 申请公布日期 2003.02.07
申请号 JP20010223847 申请日期 2001.07.25
申请人 SHIN STI TECHNOLOGY KK;SEIKO EPSON CORP 发明人 AKAMATSU CHIKASHI;TAKIZAWA KEIJI
分类号 G03F7/11;C23F1/00;G02B5/20;G02F1/1333;G02F1/1335;G03F7/40;G09F9/30;G09F9/35 主分类号 G03F7/11
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