| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a mask for charged particle beam exposure and a charged particle beam aligner in which mechanical strength is high and positioning accuracy of pattern to be exposed is not easily deteriorated. SOLUTION: In the mask for charged particle beam exposure, a plurality of sub field of visions and a supporting part surrounding the periphery of each sub field of vision are provided on a thin film. Moreover, this mask for charged particle beam exposure has a shape of the sub field of vision which is pentagonal or more polygonal, and the support part is formed in matching with the shape of the sub field of vision.</p> |
