| 摘要 |
PROBLEM TO BE SOLVED: To form an insulation film which is hard to delaminate in a process vessel in a short time. SOLUTION: The apparatus comprises a process vessel 11 wherein a work piece is placed and a plasma generating means 30 for plasma generation excited by micro wave. Before the work piece is loaded in the vessel 11, plasma is generated to deposit insulation film inside of the vessel 11. Then the work piece is placed in the vessel 11 for processing by generating plasma. The apparatus is also provide with a process control means 50, which controls a process of taking out the work piece from the process vessel 11 and cleaning the work piece by removing an insulating film deposited in the process vessel 11.
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