发明名称 CHARGED PARTICLE BEAM ALIGNER, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR MANUFACTURING PLANT, METHOD OF MAINTAINING CHARGED PARTICLE BEAM ALIGNER
摘要 <p>PROBLEM TO BE SOLVED: To accurately drive an XY stage using a linear motor disposed in a vacuum chamber as a drive source. SOLUTION: A charged particle beam aligner comprises a surface plate 21 formed of a magnetic substance which is disposed in the vacuum chamber 100, stages 22 and 23 which hold a substrate W and position the substrate at an exposure position on the surface plate by driving the linear motor 25, fluid bearings 27a, 27b, and 27c which float the stages from the surface plate by supplying a pressurized fluid, a magnet unit which is provided on opposite faces of the surface plate and the stages and generates a magnetic attraction force to pressurize the stages floated by the supply of a pressurized fluid. In order to remove, during the movement, a magnetic field which leaks through the opening of a magnetic shielding material for suppressing a magnetic field generated from the linear motor, the stage is provided at the opening, with a plurality of electromagnetic coils for generating a correction magnetic field for offsetting the leakage magnetic field, and an excitation current control means for controlling the electromagnetic coils. The stage removes the leakage magnetic field using the electromagnetic coils and the excitation current control means.</p>
申请公布号 JP2003037047(A) 申请公布日期 2003.02.07
申请号 JP20010223237 申请日期 2001.07.24
申请人 CANON INC 发明人 GOTO SUSUMU
分类号 G03F7/20;H01J37/20;H01J37/24;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 G03F7/20
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