发明名称 REDUCED DISK ACCESS FOR COMPLEX MASK GENERATION
摘要 <p>Masks from which integrated circuits are manufactured are derived from layers found in integrated circuit designs. The mapping from design layers (100) to mask layers (110) produces masks with various essential properties. The operators that transform the design layers to the mask layers consist of the Boolean operations along with fattening and shrinking. This invention shortens the compute time used in carrying out these operations by keeping all temporary layers (120) in main memory and never on disk, avoiding both disk space and access time as a result. The savings are achieved by slicing the design into overlapping pieces, each of which can fit in main memory, and carrying out the operations upon each piece before beginning the next piece.</p>
申请公布号 WO2003010692(A1) 申请公布日期 2003.02.06
申请号 US2002023699 申请日期 2002.07.23
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