发明名称 POSITIVE TYPE RADIOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN
摘要 <p>A positive type radiosensitive composition comprising the following components (A) to (C): (A) at least one compound selected from the group consisting of a hydrolyzable silane compound represented by the general formula (1): (R1)pSi(X)4-p (1) wherein R1 represents a non-hydrolyzable organic group having 1 to 12 carbon atoms, X represents a hydrolyzable group, and p represents an integer of 0 to 3, a hydrolyzate thereof and a condensed product therefrom; (B) an agent generating an acid by the irradiation with a light; and (C) a basic compound. The use of the above composition allows the production of a cured product excellent in the precision of a pattern and the like, and the above composition can be used as a material for forming an optical wave guide.</p>
申请公布号 WO2003010603(P1) 申请公布日期 2003.02.06
申请号 JP2002007343 申请日期 2002.07.19
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