发明名称 MICROELECTROMECHANICAL SYSTEM DEVICES INTEGRATED WITH SEMICONDUCTOR STRUCTURES
摘要 Microelectromechanical (MEMS) devices (620) are integrated with high frequency devices (622) on a monolithic substrate (618) or wafer. High quality epitaxial layers of monocrystalline materials can be grown overlying monocrystalline substrates (619) such as large silicon wafers by forming a compliant substrate for growing the monocrystalline layers. MEMS devices (620), such as a switch, a variable capacitance device or a temperature control structure, are formed in the base monocrystalline substrate. High frequency devices, such as transistors or diodes, are formed in the overlaying layer of monocrystalline materials.
申请公布号 WO03010086(A2) 申请公布日期 2003.02.06
申请号 WO2002US13846 申请日期 2002.05.03
申请人 MOTOROLA, INC. 发明人 BOSCO, BRUCE, ALLEN;FRANSON, STEVEN, JAMES;HOLMES, JOHN, E.;ESCALERA, NESTOR, J.;EMRICK, RUDY, M.;ROCKWELL, STEPHEN, K.
分类号 G02B6/12;G02B6/122;G02B6/13;G02B6/42;G02B6/43;H01L21/20;H01L21/822;H01L21/8258;H01L27/06;H01L27/15;H01S5/02;H01S5/022 主分类号 G02B6/12
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