A method for development, which comprises a developing step of supplying a developer to a resist film after exposure on a substrate, to develop an exposed pattern, a step of supplying an aqueous cleaning solution to the resist film having the developed pattern, a step of supplying a liquid agent which does not substantially dissolve the resist and has a surface tension less than that of water to the resultant resist film, and a step of rotating the substrate to dry it.
申请公布号
WO03010801(A1)
申请公布日期
2003.02.06
申请号
WO2002JP07505
申请日期
2002.07.24
申请人
TOKYO ELECTRON LIMITED;TOSHIMA, TAKAYUKI;AOYAMA, TORU;IWAKI, HIROYUKI