STAGE APPARATUS,EXPOSURE SYSTEM AND EXPOSURE METHOD,AND DEVICE PRODUCTION METHOD

摘要

A stage control system (19), while restricting a reduction in a control performance in one stage when an exposure operation is performed in that stage (WST1), performs an alignment operation in the other stage (WST2), thereby restricting a reduction in a control performance in one−stage exposure operation caused by an operation in the other stage. Accordingly, simultaneous, parallel processings in two stages can positively attain accuracy required by an operation performed in each stage while keeping high throughput in an exposure process.