EXPOSURE DEVICE,EXPOSURE METHOD,METHOD OF PRODUCING SEMICONDUCTOR DEVICE,ELECTROOPTIC DEVICE,AND ELECTRONIC EQUIPMENT

摘要

An exposure device (100) having a vertically movable stage device (120) and adapted to effect exposure by projecting a pattern recorded on a hologram mask (130) onto an exposure subject substrate (110) formed with a photosensitive material film (112) and placed on the stage device, comprises a film thickness measuring mechanism (160, 162) that measures the thickness of the photosensitive material film (112), it being arranged that the quantity of exposure light from an exposure source (140) is controlled on the basis of the measured film thickness by a light quantity control mechanism (162). Since a proper quantity of light is set according to the film thickness, a correct pattern can be formed by a single exposure.