| 发明名称 |
Atomic oxygen-resistant film |
| 摘要 |
An atomic oxygen-resistant film comprising an atomic oxygen-resistant film formed on a polyimide film, wherein the mass reduction rate thereof is no greater than 1.0% when irradiated with atomic oxygen at an irradiation dose of appromixately 3x1020 atoms/cm2 at a speed of about 8 km/sec.
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| 申请公布号 |
US2003026998(A1) |
申请公布日期 |
2003.02.06 |
| 申请号 |
US20020208282 |
申请日期 |
2002.07.30 |
| 申请人 |
UBE INDUSTRIES, LTD. |
发明人 |
YAMAGUCHI HIROAKI;SATO RYOICHI;HASHIGUCHI SHUICHI;KOHDA MASAFUMI |
| 分类号 |
C08G73/10;C08J7/04;C08L79/08;C08L83/10;(IPC1-7):B05D3/02 |
主分类号 |
C08G73/10 |
| 代理机构 |
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