| 摘要 |
<p>An apparatus for supplying tetrafluoroethylene gas to a dry etching device which has a membrane separator for separating a mixed tetrafluororthylene (TFE)/carbon dioxide (CO2) gas into respective gas components, a gas supplying section for supplying the mixed TFE/CO2 gas to the membrane separator, a TFE supplying mechanism for supplying TFE separated in the membrane separator to a dry etching device, and a CO2 discharge mechanism for discharging CO2 separated in the membrane separator.</p> |
