发明名称 Photochemical system and method for the removal of PCDD or PCDF compounds from industrial process emissions
摘要 A photochemical process for removing or minimizing the concentration of PCDD or PCDF compounds within an industrial gas stream. The process includes the direct photolysis of PCDD or PCDF compounds. Light within a particular spectral range is irradiated into the gas stream and is absorbed by the PCDD and PCDF compounds in the presence of a hydrogen donor and this results in producing a lower chlorinated PCDD or PCDF compound form. In addition, the gas stream may be treated by removing particular matter therefrom and thereafter subjected to the above-described irradiation. Further, as another optional step, the gas stream may be irradiated with the specific purpose of targeting PCDD and PCDF precursor compounds. In this case, the irradiation is absorbed the precursor compounds causing them to be chemically modified to different chemical compounds that do not participate in chemical reactions that result in the formation of PCDD and PCDF compounds.
申请公布号 US2003028066(A1) 申请公布日期 2003.02.06
申请号 US20010847476 申请日期 2001.05.02
申请人 RICHARDS JOHN R.;RICHARDS DANIEL M.;BROZELL TODD T.;HOLDER TOMMY E.;GOSHAW DAVID G. 发明人 RICHARDS JOHN R.;RICHARDS DANIEL M.;BROZELL TODD T.;HOLDER TOMMY E.;GOSHAW DAVID G.
分类号 B01D46/02;B01D53/70;(IPC1-7):A62D3/00;C01B7/01;C07B63/02;B03C3/017 主分类号 B01D46/02
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