发明名称 Display apparatus and method for correcting electron beam landing pattern
摘要 A display apparatus according to the present invention includes an electron beam landing pattern correction coil disposed at the rear side of a deflection yoke provided on a cathode-ray tube and a correction current generating device for generating a correction current corresponding to an electron beam landing pattern and supplying the current to this electron beam landing pattern correction coil. This correction current is obtained by selectively combining a plurality of waveform current components (e.g., DC current component, a saw-tooth wave component, a parabolic waveform component, a sine waveform component, etc.) which can respectively correct a plurality of fundamental electron beam landing patterns in response to a difference in beam-landing position. Thus, after the display apparatus has been manufactured, the difference in beam-landing position of the manufactured display apparatus can be corrected to the details on the whole screen.
申请公布号 US2003025467(A1) 申请公布日期 2003.02.06
申请号 US20020207212 申请日期 2002.07.30
申请人 TANAKA MASANAGA;HOSOKAWA HIROMU 发明人 TANAKA MASANAGA;HOSOKAWA HIROMU
分类号 H01J9/44;G09G1/04;G09G1/28;H01J29/76;H01J31/00;H04N3/23;H04N9/29;(IPC1-7):G09G1/04 主分类号 H01J9/44
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