| 摘要 |
<p>A method for development, which comprises a developing step of supplying a developer to a resist film after exposure on a substrate, to develop an exposed pattern, a step of supplying an aqueous cleaning solution to the resist film having the developed pattern, a step of supplying a liquid agent which does not substantially dissolve the resist and has a surface tension less than that of water to the resultant resist film, and a step of rotating the substrate to dry it.</p> |
